Compare wet etching and Dry etching

0

8.2kviews

Compare wet etching and Dry etching

written 7.7 years ago by

hetalgosavi • 1.6k

modified 4.8 years ago by

shubhamshukla • 40

mems technology

ADD COMMENT EDIT

1 Answer

1

145views

written 7.7 years ago by

hetalgosavi • 1.6k

modified 5.0 years ago by

ankitpandey • 100

Parameters	Dry Etching	Wet etching
Directionality	Good for most materials	Only with crystal materials [Aspect ratio upto 100]
Production automation	Good	Poor
Environmental impact	Low	High
Masking film adherence	Not as critical	Very critical
Selectivity	Poor	Very Good
Materials to be etched	Only certain materials	All
Process scale-up	Difficult	Easy
Cleanliness	Conditionally clean	Good to very good
Equipment cost	Expensive	Less expensive
Operational parameters	Many	Few
Typical etch rate	Slow [$0.1 \mu m/min$] to fast [$6 \mu m/min$]	Fast [$1 \mu m/min \ and \ up$]
Control of etch rate	Good in case of slow etch	Difficult
Application:For making very small features in thin films	Possible to etch almost straight down without under cutting	Undercutting problem will occur

ADD COMMENT EDIT

Please log in to add an answer.