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Explain the steps in standard RCA cycle, during wafer cleaning.
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written 2.1 years ago by | • modified 2.0 years ago |
Contamination on a wafer consists of particles which must be removed by wafer cleaning In order to remove metallic impurities, organic contamination etc. wafers were subjected to standard RCA clearing procedure.
The purpose of RCA clean is to remove organic contaminants from the wafer surface, then remove any oxide layer …