Mumbai University > Electronics Engineering > Sem 8 > MEMS Technology

Marks: 3M

• Anisotropic etching is easier to control of the etched shape of the substrates.

• Disadvantages:

• Slower in rate of etching (< 1 µm/minute)

• The rate is temperature – sensitive.

• Best performance at elevated temperature eg. 1000 C.

  Temperature resistive mask materials.