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Anisotropic etching of silicon
written 7.7 years ago by gravatar for teamques10 teamques10 ★ 64k modified 2.2 years ago by gravatar for pedsangini276 pedsangini276 • 4.7k

Mumbai University > Electronics Engineering > Sem 8 > MEMS Technology

Marks: 3M
mems technology
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written 7.7 years ago by gravatar for teamques10 teamques10 ★ 64k

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  • Anisotropic etching is easier to control of the etched shape of the substrates.

  • Disadvantages:

  • Slower in rate of etching (< 1 µm/minute)

  • The rate is temperature – sensitive.

  • Best performance at elevated temperature eg. 1000 C.

    Temperature resistive mask materials.
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