0
5.4kviews
Give the steps in a standard RCA cycle during wafer cleaning.
1 Answer
0
312views

Contamination on a wafer consists of particles which must be removed by wafer cleaning. In order to remove metallic impurities, organic contaminants etc. wafers were subjected standard RCA cleaning procedure.

The purpose of the RCA clean is to remove organic contaminants (such as dust particles, grease or silica gel) from …

Create a free account to keep reading this post.

and 2 others joined a min ago.

Please log in to add an answer.