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Give the steps in a standard RCA cycle during wafer cleaning.
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| written 7.2 years ago by |
Contamination on a wafer consists of particles which must be removed by wafer cleaning. In order to remove metallic impurities, organic contaminants etc. wafers were subjected standard RCA cleaning procedure.
The purpose of the RCA clean is to remove organic contaminants (such as dust particles, grease or silica gel) from …