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What is Ion beam etching technique?
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written 7.1 years ago by
teamques10
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The ion beam etching (IBE) is a physical dry etch process.
Thereby argon ions are radiated onto the surface as an ion beam with about 1 to 3 keV. Because of the energy of the ions, they strike out material of the surface.
The wafer is held perpendicular or tilted …
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